NaMLab

Impact of field stress pattern on the performance of HfO2-based ferroelectric tunnel junctions

https://pubs.aip.org/aip/jap/article/139/22/224101/3394040/Impact-of-field-stress-pattern-on-the-performance

Achieving a Dielectric Constant of 60 in ZrxHf1−xO2:

A Candidate for DRAM?

https://ieeexplore.ieee.org/document/11532794

A Compendium of Logic Gates Based on Reconfigurable Three-Independent-Gate Transistors Realized in FDSOI Hardware

https://advanced.onlinelibrary.wiley.com/doi/10.1002/aelm.202500782